Hydrofluoric Acid Resistant Photoresist for Wet Etching of Glass
Glibes N-100 is an alternative resist that is extremely resistant to hydrofluoric acid, allowing small, deep patterns to be formed in wet etching (engraving) of glass.
Glibes N-100 offers excellent resistance to hydrofluoric acid and can be used for wet etching of glass.
Measurement Dimensions | ||
---|---|---|
① Resist Dimensions |
② Etching Width |
③ Etching Depth |
43.3 | 110.6 | 30.3 |
Glass cutting by wet etching is capable of cutting without generating micro-cracks on the cutting surface, which makes it possible to secure more than twice the strength of glass compared to the mechanical cutting method.
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