EUV Resist

Bringing Together Years of Photosensitive
Resin Development

As a specialized resist manufacturer, Tokyo Ohka Kogyo has been engaged in research and development, manufacturing, and sales of resists starting with rubber-based negative resists until present day. We are also continuing to research and develop EUV resists with absorption wavelength of 13.5nm, the most advanced technology today, and are already approved for use in mass production lines. We will continue our corporate activities to respond to the voices and demands of our customers.