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Photoresist Ancillaries
Chemicals that are used together with resists in the lithography process are called resist ancillaries.
Developer and Rinse Solutions
The developer creates patterns by taking advantage of the difference in solubility between the exposed and unexposed areas of the resist.
Thinners
Thinners are used for many processes such as edge rinsing and back rinsing after resist application.
Stripping Solution
Stripping solutions are used to remove resist after etching and to remove impurities generated during etching.
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