Tokyo Ohka Kogyo Product Site
Display Resist
TFR-Di Series
High Surface Uniformity, Microfabrication, High-Sensitivity Photoresist for Large Substrates
This is a positive photoresist for wiring patterning designed and developed for display applications using large glass substrates. The product lineup includes both spin coat and slit coat resists. In addition to the longitudinal control and etchant resistance required, these resists offer excellent on-surface uniformity when applied to large substrates. In addition, they can be used on a wide range of substrates, including Al and ITO.
Features
- High refinement
- High sensitivity
- Wide focus margin
| DOF @ 1.3 μm L/S EOP | |
|---|---|
| TFR-DI750 | 18 μm (-9~+9 μm) |
MASK Dimensions
| 1.5 μm | 1.4 μm | 1.3 μm | 1.2 μm |
|---|---|---|---|
| TFR-DI750@ 42mJ/cm2 | EOP | ||
 |
 |
 |
 |
MASK C.D.
| 1.5 μm | 1.4 μm | 1.3 μm | 1.2 μm |
|---|---|---|---|
| TFR-DI750@ 42mJ/cm2 | |||
|
|
EOP |
|
| DI NEXT@ 42mJ/cm2 | |||
 |
 |
 EOP |
 |
TFR in the text is a pending or registered trademark of TOK.
Please Feel Free to Contact Us for More Information
For any questions or concerns,
Send an Inquiry Through the Web
Contact Us/Download Information
Please contact us if you have any requests or problems.
You can also access information related to each product.