Tokyo Ohka Kogyo Product Site
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Detailed information on the features and product data of materials and equipment such as photoresists, surface modifiers, structure forming materials, functional materials, high purity chemicals, and processing equipment specialized for manufacturing processes is available.
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I-Line Resist Lineup
KrF Resist Lineup
ArF Resist Lineup
EB Resist Lineup
G-Line Resist
I-Line Resist
ArF Resist (TARF-P7052)
KrF Resist (TDUR-P6112)
KrF Resist (TDUR-P6159)
KrF Resist (TDUR-P7117)
Lift-Off Resist
Roll Coater Resist
Deep Dry Etching Resist
Redistribution Layer (RDL) Resist
Bump Formation Resist
Developer Solution
Stripping Solution & Other
Stripping Solution for Thick Films
Photosensitive Permanent Films
Film Formation Materials
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Zero Newton TWM12000 Series
Zero Newton TWR12000 Series
Zero Newton TWM36000 Series
Zero Newton TWR36000 Series
Spinless TN3600S Series
Spinless TN9000S Series
Semiconductor Spin Coater/Developer CS Series
TCA -7000 Series
Zero Newton and Spinless in the text are pending or registered trademarks of TOK.
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Photosensitive Liquid Repellent Coating Materials
Super Hydrophilic Coating Materials
Super Hydrophilic Coating Materials With Enhanced Durability
High Durability UV Nanoimprinting Materials
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