EB Resist

These are resists for electron beam.

This product is mainly used for semiconductor photomask production. Both positive and negative types are available with high sensitivity and pattern stability.

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Positive Type OEBR-CAP Series

Three positive types of resist are available, of which one has sensitivity priority and one has resolution priority.

Negative Type OEBR-CAN Series

Two types of negative type resist are available, one with sensitivity and one with resolution priority.

EBR in the text is a pending or registered trademark of TOK.