EB Resist

These are resists for electron beam.

This product is mainly used for semiconductor photomask production. Both positive and negative types are available with high sensitivity and pattern stability.

Positive Type OEBR-CAP Series

Three positive types of resist are available, of which one has sensitivity priority and one has resolution priority.

Positive Type OEBR-CAP Series
Positive Type OEBR-CAP Series

Negative Type OEBR-CAN Series

Two types of negative type resist are available, one with sensitivity and one with resolution priority.

Negative Type OEBR-CAN Series

EBR in the text is a pending or registered trademark of TOK.

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