Transparent Materials

Special Photoresists for High Transmittance and High Reliability Films

We offer a range of photoresists that can be patterned by the photolithography process to ensure high transmittance of 98% or more in the visible light range.
After photolithographic patterning, thermal flow or etching can be used to form a convex lens-like transparent insulating layer. This is a special-purpose photoresist that can be used to form high transmittance and high reliability films for use as a MEMS sensor, CIS microlens, and transparent insulating layer.
We also offer photosensitive transparent adhesives with a transmittance of 99% and a refractive index of nk = 1.51~1.53 in the wavelength range of 400nm or longer.
Transparent adhesives can be used for permanent bonding of semiconductor chips and glass substrates, and for mounting of optical sensors and glass substrates.