Stripping Solution

Originally developed for the removal (stripping) of rubber-based negative resists, the use of positive resists has led to the development of strippers for both negative and positive resists.
Furthermore, in consideration of the environment, we have realized the elimination of chlorinated solvents and the implementation of non-phenol, and offer a variety of stripping solutions for each resist.
We have also commercialized stripping solutions that specialize in removing deposited or altered membranes after ashing or dry etching, and stripper solutions that take into account metal damage on devices.

Purpose for Using Stripping Solution

Removes Unnecessary Resist After Etching the Bottom Layer

Removes Unnecessary Resist After Etching the Bottom Layer
Removes Unnecessary Resist After Etching the Bottom Layer

Removes Deposited (Unwanted) Material Generated During Etching

Removes Deposited (Unwanted) Material Generated During Etching
Removes Deposited (Unwanted) Material Generated During Etching

Stripping Solution for Both Negative and Positive Types

Stripping Solution for Both Negative and Positive Types

Stripping Solution 502A

Stripping solution 502A is a stripper for negative and positive photoresists that does not contain chlorinated solvents, which have become a problem in recent years due to environmental pollution. We have also commercialized Clean Strip HP-2, which does not contain phenol.

Relationship Between Stripping Solutions

Relationship Between Stripping Solutions

Stripping Solution for Deposited Materials

Stripping Solution for Deposited Materials

Stripping Solution for Deposited Materials SST-A2

As patterns become smaller and finer, it becomes more difficult to remove deposited materials after dry etching, and a more powerful stripping solution is required.
SST-A2 is a water-soluble stripping solution for deposited materials after dry etching of Al-Si, Tin/Al-Si-Cu/TiN, Al-Si-Cu/TiN, Al-Si-Cu/TiN interconnects, SiO2/TiN/Al-Si-Cu, and SiO2/TiN/Al-Si holes at room temperature in a short time without damage to the metal.

SST-A2 Stripping Ability

Before Stripping Treatment
SST-A2 Stripping Ability

Residuals such as deposited materials are removed by low temperature treatment (23℃, 20min).

Stripping Solution for Thick Films

Stripping Solution for Thick Films

ST-120

ST-120 is a stripping solution for thick film resists. It allows for water rinsing and low metal damage.
This is a SEM photo of ST-120.

After Resist Removal

ST-120 Stripping Ability

  Positive Resist Negative Resist
Initial Stage Positive Resist:Initial Stage Negative Resist:Initial Stage
Stripper 104 60℃, 20min
×
Positive Resist:Stripper 104 60℃, 20min × Negative Resist:Stripper 104 60℃, 20min ×
ST-120 40℃, 10min
Positive Resist:ST-120 ST-120 40℃, 10min 〇 Negative Resist:ST-120 ST-120 40℃, 10min 〇

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