This equipment is capable of improving the heat resistance, dry etching resistance, and chemical resistance of various organic thin films.
UV Curing System Compatible With G-Line, I-Line, and KrF Resists.
This series is compatible with 100/125/150/200/300mm wafers and is equipped with a wave length modulation system to match the film characteristics. As a top photoresist manufacturer, Tokyo Ohka Kogyo offers its own UV curing process based on chemical reaction. Even transparent films can be cured without degrading the transmittance. It can also be used for thinner wafers such as power semiconductors.
|UV System||Irradiation unit x 1 set|
|Processing Environment||Environment control|
|Conveyance System||Air conveyance system|
|Processing Temperature||RT~90℃ / heater specification︓90~200℃|
|Vacuum Pump||Dry pump x 1 unit|
|Signal||GEM/GEM300 *Only 300mm equipment|
|Heat Resistance||Improves heat resistance of resists by 50℃ or more|
|Dry Etching Resistance||Improves dry etching resistance of resists by more than 10%|
|Particle||＜30 particles/0.2μm-up (300mm wafer)|
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